Woodstock AIR Program
Residency program for artists of color working in the photographic arts
The Woodstock Artist-in-Residency Program is designed to support artists of color working in the photographic arts who reside in the United States that would benefit from access to time, facilities, financial, critical, and technical support. The drive for this program is to free the artist from the busy routines and demands of everyday life – and to provide a sanctuary for creativity.
WOODSTOCK AIR encourages participants to pursue creative risk-taking in an environment rich in cultural resources. Working without distraction or interruption, participants focus intensely on their own work; continuing works in progress, setting goals for the future, and breaking new ground.
Each year CPW offers seven Artist Residencies for artists of color and one Critical Studies Residency for a curator/critic of color.
So that the program may continue to impact as many new artists as possible, former residents may not reapply (as of 2015). WOODSTOCK AIR marks the first residency experience of over 65 percent of its participants.
- accommodations at a residence located within walking distance from CPW and the center of Woodstock’s business district
- 24/7 access to CPW’s workspace facilities, including darkroom, digital lab (large format printers, flatbed and dedicated film scanners), and library
- critical and technical support
- stipend for food and travel, and honorarium
- exhibition and related opportunities
Established in 1999, WOODSTOCK AIR has been made possible in part with support from the Andy Warhol Foundation for the Arts, Phillip & Edith Leonian Foundation, the Milton & Sally Avery Foundation, the Gunk Foundation, the National Endowment for the Arts, the New York State Council on the Arts (NYSCA), a state agency, with support from Governor Andrew Cuomo and the New York State Legislature, and individuals.
For more information on the WOODSTOCK AIR program, please review How to Apply and other resources linked on the top left of this page.